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Brewer Science Showcases Original Technology Products at 2017 SPIE Advanced Lithography

Will be featured at three sessions covering technology innovation.

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By: DAVID SAVASTANO

Contributing Editor, Coatings World and Ink World, Coatings World and Ink World Magazine

Brewer Science will exhibit at SPIE Advanced Lithography, Feb. 26-March 2 in San Jose, CA. The company will showcase original technology products created and manufactured at Brewer Science. Attendees will have the opportunity to learn more about the Brewer Science suite of lithography products, wafer-level packaging products, and the newest carbon nanotechnology products.
 
For more than 40 years, SPIE has been regarded as the leading international event driving the future of lithography research and applications and continues to be the largest gathering of lithography experts in the world.
 
Join Brewer Science at the following sessions to learn more about technology innovation:
• Molecular force modeling of lithography – Zhimin Zhu, Brewer Science, Inc. (US).
• High-χblock copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing – Kui Xu, Mary Ann J. Hockey, Richard Daugherty, Eric Calderas, Daniel Sweat, Jeffrey Fiehler, Michaela Veik, Brewer Science, Inc. (US).
• A track process for solvent annealing of high-χBCPs – Douglas J. Guerrero, Brewer Science, Inc. (Belgium); Harold W. Stokes, SCREEN SPE Germany GmbH (Germany); Xavier Chevalier, Arkema S.A. (France); Ahmed Gharbi, CEA-LETI (France); Kaumba Sakavuyi, Brewer Science, Inc. (US); CĂ©lia Nicolet, Arkema S.A. (France); Raluca Tiron, CEA-LETI (France); Kui Xu, Brewer Science, Inc. (US); Isabelle Servin, Laurent Pain, CEA-LETI (France).

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